58 Main Street, Sturbridge, MA 01566
Phone: (508) 347-2009     e-mail: jbv@jbvoptical.com

Achromatic Laser Beam Homogenizer/Attenuator

The JBV Laser Beam Homogenizer provides a "flat top" beam profile at the image plane when working with laser beams. It has a built-in attenuator which allows the transmitted energy to be varied. The input beam can have gaussian or non-gaussian distribution and any wavelength in the range of 193nm to 248nm and up to 308nm. Applications include:

  • Laser Materials Processing
  • Photoresist exposure systems
  • Laser Ablation Systems
  • Excimer Micro-machining
  • Other precision applications


The device consists of three major modules, integrated into one compact housing: The Fine Attenuator, The Step Attenuator, and the Homogenizer.

The Fine Attenuator provides continuous adjustment of the beam power using micrometer screws. When it is fully open, full beam power passes. When fully closed, only 4% of input energy passes.

The Coarse Attenuator is used to change the power in steps. When open, full input energy may pass; when closed, 10% of input power is passed. When both attenuation stages are fully closed, only 0.25% of input energy passes through the device.

Parameter Specification
Wavelength 193nm to 308nm
Input Beam Size 1cm x 2 cm max
Input Beam Divergence 1 mrad Vert; 3 mrad Hor.
Input Beam Profile Gaussian or Non-Gaussian
Beam Energy @ 193nm 290mJ
Beam Energy @ 248nm 260mJ
Input Beam Radiance 250mJ per cm2
Standoff Distance .28 m maximum
Beam Size at Image (working plane) 0.5 cm x 0.5 cm (95% Energy, FWHM)
Attenuation Manual, 5% to 90% progressive
Attenuation Resolution 0.5%
Call JBV to Discuss: FREE OPTICAL DESIGN of this system to fit your needs!

Your Name:
Company Affiliation (optional):
Street Address or PO Box:
City or Town:
Zip Code:
Country (if different):
Your e-mail address:
Your phone number (optional):
Size of area to be illuminated (size of field at substrate)?
Shape of the illumination area (square, etc....)?
What is the required energy density per square centimeter (at substrate)?
Is the material going to be located in a chamber or in normal atmosphere?
What is the min and max separation between the last optic and the application?
What degree of homogeneity is required?
Laser wavelength?
Repetition rate?
Current laser type?
Laser Beam size?
Is there an imaging lens after the uniform illuminated area?

Additional Pertinent Information: